US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on Dec. 30 for "Semiconductor reaction chamber and semiconductor processing apparatus" (Chinese Inventor)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,512,334, issued on Dec. 30, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing).

"Semiconductor reaction chamber and semiconductor processing apparatus" was invented by Jian Liu (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure provide a semiconductor reaction chamber, including a chamber body, an electrostatic chuck, a functional wire, and a pressure adjustment device. The chamber body includes an inner chamber. The electrostatic chuck is located in the inner chamber and includes a base body and a functional layer. The base body includes a connection wire channel. The functional layer ...