US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on Aug. 12 for "Coil structure for generating plasma and semiconductor equipment" (Chinese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,387,906, issued on Aug. 12, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing).

"Coil structure for generating plasma and semiconductor equipment" was invented by Jinrong Zhao (Beijing), Song Wang (Beijing), Gang Wei (Beijing) and Jinji Xu (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a coil structure for generating plasma and semiconductor processing equipment. The coil structure includes at least one coil set. The coil set includes a first sub-coil set and a second sub-coil set that are coaxially arranged. The first sub-coil set includes at least one first planar coil located in a firs...