ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,417,900, issued on Sept. 16, was assigned to Beijing E-Town Semiconductor Technology Co. Ltd. (Beijing) and Mattson Technology Inc. (Fremont, Calif.).
"Plasma processing apparatus" was invented by Maolin Long (Santa Clara, Calif.), Weimin Zeng (San Jose, Calif.) and Yu Guan (Pleasanton, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus including a processing chamber having one or more sidewalls and a dome is provided. The plasma processing apparatus includes a workpiece support disposed in the processing chamber configured to support a workpiece during processing, an induction coil assembly for producing a plasma in th...