ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,661, issued on July 1, was assigned to Beijing E-Town Semiconductor Technology Co. Ltd. (Beijing) and Mattson Technology Inc. (Fremont, Calif.).
"Pressure control system for a multi-head processing chamber of a plasma processing apparatus" was invented by Maolin Long (Santa Clara, Calif.), Changle Guan (Beijing) and Junliang Li (Wuhan, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "A pressure control system is provided. The pressure control system includes a member at least partially positioned within a pumping port fluidly coupled between a multi-head processing chamber and a pump configured to evacuate gases from the multi-head processing cha...