ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,198, issued on Nov. 25, was assigned to Beijing BOE Technology Group Co. Ltd. (Beijing).
"Mask, and manufacturing method for mask" was invented by Na Bi (Beijing), Shanshan Bai (Beijing) and Yue Liu (Beijing).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a mask and a manufacturing method for the mask, aiming to solve the problem in the prior art of the easy occurrence of color mixing due to the inaccurate position of evaporation when a pattern of a light-emitting substrate is formed by means of a mask. The mask for covering a mother board, which is formed by a multi-division exposure procedure and thus has a substrate invalid region th...