ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,332, issued on Sept. 30, was assigned to Axcelis Technologies Inc. (Beverly, Mass.).
"High energy implanter with small footprint" was invented by Wilhelm Platow (Newburyport, Mass.), Shu Satoh (Byfield, Mass.) and Neil Bassom (Hamilton, Mass.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A high-energy ion implantation system has an ion source and mass analyzer to form and analyze an ion beam along a beam path. A first RF LINAC accelerates the ion beam to a first accelerator exit, and a second RF LINAC accelerates the ion beam to a second accelerator exit along the beam path. A first magnet between the first and second RF LINACs alters the beam pat...