US Patent Issued to Axcelis Technologies on Nov. 4 for "High temperature ion source" (New Hampshire, Massachusetts Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,003, issued on Nov. 4, was assigned to Axcelis Technologies Inc. (Beverly, Mass.).

"High temperature ion source" was invented by Shu Satoh (Byfield, Mass.) and Neil Colvin (Merrimack, N.H.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An arc chamber for an ion source provides a source of thermal radiation positioned within an interior region of the arc chamber. One or more components generally enclose the interior region of the arc chamber, defining an arc chamber environment within the interior region of the arc chamber. A thermal radiation shield is positioned between the one or more components and an external environment outside of the arc chambe...