ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,085, issued on Nov. 18, was assigned to Axcelis Technologies Inc. (Beverly, Mass.).

"Shielded gas inlet for an ion source" was invented by Neil K. Colvin (Merrimack, N.H.), Neil Bassom (Hamilton, Mass.) and Joshua Abeshaus (Salem, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ion source has arc chamber having one or more radiation generating features, an arc chamber body enclosing an internal volume, and at least one gas inlet aperture defined therein. A gas source provides a gas such as a source species gas or a halide through the gas inlet aperture. The source species gas can be an aluminum-based ion source material such as dimethylalumi...