US Patent Issued to Axcelis Technologies on Dec. 16 for "Ion implantation system and method for implanting aluminum using non-fluorine-containing halide species or molecules" (American, Canadian Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,497,687, issued on Dec. 16, was assigned to Axcelis Technologies Inc. (Beverly, Mass.).

"Ion implantation system and method for implanting aluminum using non-fluorine-containing halide species or molecules" was invented by Neil Colvin (Merrimack, N.H.), David Sporleder (Billerica, Mass.), Udo H. Verkerk (Toronto), Atul Gupta (Lexington, Mass.) and Edward Moore (Newmarket, N.H.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ion implantation system, ion source, and method are provided for forming an aluminum ion beam from an aluminum-containing species to an ion source. One or more of a halide species and a halide molecule are introduced to the ion sou...