ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,498,643, issued on Dec. 16, was assigned to Authentix Inc. (Addison, Texas).
"Fabrication of microscale structures" was invented by Milad Khoshnegar Shahrestani (Coquitlam, Canada) and Ripon Dey (Maple Ridge, Canada).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for patterning a substrate involves depositing a layer of resist material on a surface of the substrate, lithographically patterning (electron beam exposing and then developing) the layer of the resist material to form a patterned resist layer having a pattern multi-faceted microscale structures with a depth profile that varies over an area of the layer of resist material, and using the...