US Patent Issued to AUROS TECHNOLOGY on June 17 for "Overlay measurement device and method, and system and program therefor" (South Korean Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,334,382, issued on June 17, was assigned to AUROS TECHNOLOGY INC. (Hwaseong-si, South Korea).

"Overlay measurement device and method, and system and program therefor" was invented by Sol-Lee Hwang (Hwaseong-si, South Korea), Hee-Chul Lim (Hwaseong-si, South Korea), Dong-Won Jung (Hwaseong-si, South Korea), Min-Ho Lee (Hwaseong-si, South Korea) and Hyun-Kyoo Shon (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers of a wafer, includes: a light source; an aperture that changes a beam from ...