US Patent Issued to Atotech Deutschland on Oct. 7 for "Method for etching at least one surface of a plastic substrate" (German Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,435,273, issued on Oct. 7, was assigned to Atotech Deutschland Gmbh & Co. KG (Berlin).

"Method for etching at least one surface of a plastic substrate" was invented by Frank Bayer (Berlin), Carl Christian Fels (Berlin), Philip Hartmann (Berlin) and Torsten Voss (Berlin).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a method for etching at least one surface of a plastic substrate, the method comprising steps (A) to (C), wherein step (B) comprises a contacting with a pre-treatment composition comprising one or more than one fluorine-free surface-active compound, and step (C) comprises a contacting with an etching compositio...