ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,122, issued on Nov. 18, was assigned to ATIK Co. LTD. (Seoul, South Korea) and ATONARP INC. (Tokyo).
"System for stabilizing flow of gas introduced into sensor" was invented by Young Ho Hong (Seoul, South Korea), Hyun Sik Choi (Bucheon-si, South Korea), Ki Woo Hong (Seoul, South Korea), Hirofumi Nagao (Tokyo) and Shinichi Miki (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a system for stabilizing a flow of gas introduced into a sensor, wherein, in connection with manufacturing equipment comprising a process chamber, a process chamber vacuum pump installed to remove internal gas of the process chamber, and a sensor device configur...