US Patent Issued to ATG CEYLON (PVT) on July 29 for "Method for making a garment material" (Sri Lankan, British, American Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,369,661, issued on July 29, was assigned to ATG CEYLON (PVT) Ltd. (Katunayake, Sri Lanka).

"Method for making a garment material" was invented by John Taylor (Telford, Great Britain), Mohamed Fazal Abdeen (B Colombo, Sri Lanka), Sunil Mendis (Gampaha, Sri Lanka) and Andrew Goth (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of making a garment material and garment material and garments obtainable by the method.The method comprises providing a first layer, which is a shaped polymer and applying a liner to the first layer, the liner being formed of yarn and having interstices through it. A fluid polymeric material is then applied to th...