ALEXANDRIA, Va., June 4 -- United States Patent no. 12,319,049, issued on June 3, was assigned to ASMPT SMT SINGAPORE PTE. LTD. (Singapore).
"Deposit levelling" was invented by Mark Alfred Whitmore (Broadstone, Great Britain) and Jeffrey David Schake (Apalachin, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing a flat feature on a substrate, comprises the steps of printing a deposit of print medium onto the substrate, the printed deposit comprising an upper surface, modifying the upper surface of the printed deposit, for example by partially drying the printed deposit, and levelling the modified deposit to produce a flat feature."
The patent was filed on Nov. 9, 2022, under Applicat...