US Patent Issued to ASML Netherlands on Sept. 9 for "Metrology apparatus based on high harmonic generation and associated method" (Dutch, German Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,421, issued on Sept. 9, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Metrology apparatus based on high harmonic generation and associated method" was invented by Peter Michael Kraus (Amsterdam), Sylvianne Dorothea Christina Roscam Abbing (Utrecht, Netherlands), Filippo Campi (Amsterdam), ZhuangYan Zhang (Berlin), Petrus Wilhelmus Smorenburg (Veldhoven, Netherlands), Nan Lin (Eindhoven, Netherlands), Stefan Michiel Witte (Hoofddorp, Netherlands) and Arie Jeffrey Den Boef (Waalre, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a metrology apparatus for measurement of a target formed on a substrate by a lit...