ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,425, issued on Sept. 9, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).
"Fluid purging system" was invented by Jose Nilton Fonseca Junior (Hamburg, Germany), Zhuangxiong Huang (Eindhoven, Netherlands), Franciscus Johannes Leonardus Heutz (Dommelen, Netherlands), Ferdy Migchelbrink (Veldhoven, Netherlands), Henricus Anita Jozef Wilhelmus Van De Ven (Echt, Netherlands), Ramo Omerovic (Heerlen, Netherlands) and Emericus Antoon Theodorus Van Den Akker (Veldhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a fluid purging system (100) for an optical element (120), comprising a fluid guiding ...