US Patent Issued to ASML NETHERLANDS on Sept. 30 for "Metrology method and associated metrology and lithographic apparatuses" (Dutch Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,781, issued on Sept. 30, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Metrology method and associated metrology and lithographic apparatuses" was invented by Sarathi Roy (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method to determine a performance indicator indicative of alignment performance of a processed substrate. The method includes obtaining measurement data including a plurality of measured position values of alignment marks on the substrate and calculating a positional deviation between each measured position value and a respective expected position value. These positional deviations are used...