ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,328, issued on Sept. 30, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Metrology method, target and substrate" was invented by Kaustuve Bhattacharyya (Veldhoven, Netherlands), Henricus Wilhelmus Maria Van Buel ('s-Hertogenbosch, Netherlands), Christophe David Fouquet (Retie, Belgium), Hendrik Jan Hidde Smilde (Veldhoven, Netherlands), Maurits Van Der Schaar (Eindhoven, Netherlands), Arie Jeffrey Den Boef (Waalre, Netherlands), Richard Johannes Franciscus Van Haren (Waalre, Netherlands), Xing Lan Liu (Veldhoven, Netherlands), Johannes Marcus Maria Beltman (Knegsel, Netherlands), Andreas Fuchs (Meerbusch, Germany), Omer Abubaker Omer Adam (Eindhoven, Netherlands)...