US Patent Issued to ASML NETHERLANDS on Sept. 30 for "Fluid handling system, method and lithographic apparatus" (Dutch Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,778, issued on Sept. 30, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Fluid handling system, method and lithographic apparatus" was invented by Cornelius Maria Rops (Waalre, Netherlands), Erik Henricus Egidius Catharina Eummelen (Veldhoven, Netherlands), Giovanni Luca Gattobigio (Eindhoven, Netherlands) and Christianus Wilhelmus Johannes Berendsen (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection syst...