US Patent Issued to ASML Netherlands on Sept. 23 for "Mark to be projected on an object during a lithographic process and method for designing a mark" (Dutch Inventor)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,757, issued on Sept. 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Mark to be projected on an object during a lithographic process and method for designing a mark" was invented by Benoit Herve Gaury (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A non-transitory computer-readable medium stores a set of instructions for performing operations to design a mark for assessing a lithographic process. The operations include determining an overlay step that represents a difference between different overlay distances of the different overlay configurations for a design of the mark. The mark includes a first lay...