US Patent Issued to ASML NETHERLANDS on Sept. 23 for "Component for use in a lithographic apparatus, method of protecting a component and method of protecting tables in a lithographic apparatus" (Dutch Inventor)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,759, issued on Sept. 23, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Component for use in a lithographic apparatus, method of protecting a component and method of protecting tables in a lithographic apparatus" was invented by Marcus Adrianus Van De Kerkhof (Helmond, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of protecting a component of a lithographic apparatus, the method including the steps of: providing a protective cover which is shaped to protect at least part of said component, the protective cover having a contact surface which is arranged to adhere to a first surface of at least part of said lit...