US Patent Issued to ASML NETHERLANDS on Sept. 2 for "Method of determining a mark measurement sequence, stage apparatus and lithographic apparatus" (Dutch Inventors)

ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,405,542, issued on Sept. 2, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method of determining a mark measurement sequence, stage apparatus and lithographic apparatus" was invented by Istvan Nagy (Eindhoven, Netherlands), Ozer Duman (Eindhoven, Netherlands), Arjan Gijsbertsen (Vught, Netherlands), Pieter Jacob Heres (Veldhoven, Netherlands), Rudolf Michiel Hermans (Eindhoven, Netherlands), Erik Jansen (Eindhoven, Netherlands), Thomas Augustus Mattaar (Veldhoven, Netherlands), Norbertus Josephus Martinus Van Den Nieuwelaar (Tilburg, Netherlands) and Petrus Franciscus Van Gils (Rijen, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark O...