US Patent Issued to ASML NETHERLANDS on Sept. 2 for "Lithographic apparatus, device manufacturing method, and method of correcting a mask" (Dutch Inventor)

ALEXANDRIA, Va., Sept. 3 -- United States Patent no. RE50,571, issued on Sept. 2, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Lithographic apparatus, device manufacturing method, and method of correcting a mask" was invented by Johannes Catharinus Hubertus Mulkens (Valkenswaard, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A lithographic apparatus includes a mask correction system configured to controllably and locally alter a property of a mask, for example transmissivity, transmissivity to a particular polarization state, birefringence and/or geometry. The mask correction system, in an embodiment, directs a beam of radiation onto a spot of the mask, the mask being scanned...