ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,868, issued on Sept. 16, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Non-correctable error in metrology" was invented by Arie Van Den Brin (Gemert, Netherlands) and Simon Hendrik Celine Van Gorp (Oud-Turnhout, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "Apparatus and methods for determining a focus error for a lithographic apparatus and/or a difference between first and second metrology data. The first and/or second metrology data includes a plurality of values of a parameter relating to a substrate, the substrate including a plurality of fields including device topology. The apparatus may include a processor configu...