ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,870, issued on Sept. 16, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).
"Measuring method and measuring apparatus" was invented by Johan Reinink (Uden, Netherlands), Jeroen Cottaar (Eindhoven, Netherlands), Sjoerd Nicolaas Lambertus Donders (Vught, Netherlands) and Sietse Thijmen Van Der Post (Utrecht, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "Apparatus and method for measuring one or more parameters of a substrate using source radiation emitted from a radiation source and directed onto the substrate. The apparatus comprises at least one reflecting element and at least one detector. The at least one reflecting elem...