US Patent Issued to ASML NETHERLANDS on Sept. 16 for "Machine learning based subresolution assist feature placement" (California Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,854, issued on Sept. 16, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Machine learning based subresolution assist feature placement" was invented by Jun Tao (Cupertino, Calif.), Yu Cao (Saratoga, Calif.) and Christopher Alan Spence (Los Altos, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for training a machine learning model to generate a characteristic pattern, the method includes obtaining training data associated with a reference feature in a reference image. The training data includes (i) location data of each portion of the reference feature, and (ii) a presence value indicating whether the portion of the ...