US Patent Issued to ASML Netherlands on Oct. 7 for "Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method" (Dutch Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,470, issued on Oct. 7, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method" was invented by Armand Eugene Albert Koolen (Nuth, Netherlands), Simon Gijsbert Josephus Mathijssen (Rosmalen, Netherlands), Hui Quan Lim (Eindhoven, Netherlands) and Amanda Elizabeth Anderson (Valkenswaard, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method of measuring a target on a substrate comprising: illuminating a target with measurement radiation comprising at least a first wavelength, collecting ...