US Patent Issued to ASML NETHERLANDS on Oct. 21 for "Sub-field control of a lithographic process and associated apparatus" (Dutch Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,449,735, issued on Oct. 21, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Sub-field control of a lithographic process and associated apparatus" was invented by Jacob Fredrik Friso Klinkhamer (Tilburg, Netherlands), Valerio Altini (Eindhoven, Netherlands), Hans Erik Kattouw (Arnhem, Netherlands) and Theo Wilhelmus Maria Thijssen (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for determining a correction for control of a lithographic process for exposing a pattern on an exposure field using a lithographic apparatus. The method including obtaining a spatial profile describing spatial variation of a perfor...