US Patent Issued to ASML Netherlands on Oct. 14 for "Measurement system and method for characterizing a patterning device" (Dutch Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,443,115, issued on Oct. 14, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Measurement system and method for characterizing a patterning device" was invented by Andre Bernardus Jeunink (De Lutte, Netherlands), Erik Henricus Egidius Catharina Eummelen (Veldhoven, Netherlands), Bearrach Moest (Eindhoven, Netherlands), Derk Onck (Leende, Netherlands), Johannes Adrianus Cornelis Maria Pijnenburg (Moergestel, Netherlands) and Hermen Folken Pen (Vught, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method is provided for determining surface parameters of a patterning device, comprising the steps of: positioning the patterning d...