US Patent Issued to ASML Netherlands on Nov. 4 for "Wavelength selection module, illumination system and metrology system" (Dutch Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,460,971, issued on Nov. 4, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Wavelength selection module, illumination system and metrology system" was invented by Gerbrand Van Der Zouw (Waalre, Netherlands), Marinus Johannes Maria Van Dam (Venlo, Netherlands), Jacob Sonneveld (Best, Netherlands) and Ramon Pascal Van Gorkom (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a wavelength selection module for a metrology apparatus. The wavelength selection module comprises one or more filter elements being operable to receive an input radiation beam comprising multiple wavelengths to provide selective control...