ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,461,449, issued on Nov. 4, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Systems and methods for lithographic tools with increased tolerances" was invented by Jasper Winters (Vieuw Vennep, Netherlands), John Erwin Van Zwer (Pijnacker, Netherlands), Johannes Marcus Van Der Lans (Hillegom, Netherlands), Willem Herman Pieter De Jager (Middelbeers, Netherlands) and Anton Emiel Van De Ven (Eindhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of use for a lithographic tool includes scanning a substrate relative to a first micro-lens array (MLA) and a second MLA each having rows of lenslets. The first MLA has functio...