US Patent Issued to ASML Netherlands on Nov. 4 for "Multiple charged-particle beam apparatus and methods" (California Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,010, issued on Nov. 4, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Multiple charged-particle beam apparatus and methods" was invented by Weiming Ren (San Jose, Calif.), Xuedong Liu (San Jose, Calif.), Xuerang Hu (San Jose, Calif.), Zhong-wei Chen (San Jose, Calif.) and Martinus Gerardus Johannes Maria Maassen (San Francisco).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods of mitigating Coulomb effect in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam along a primary optical axis, a first aperture array com...