US Patent Issued to ASML NETHERLANDS on Nov. 4 for "Asymmetry extended grid model for wafer alignment" (Dutch, American Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,461,457, issued on Nov. 4, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Asymmetry extended grid model for wafer alignment" was invented by Joshua Adams (Wilton, Conn.), Leonardo Gabriel Montilla (Norwalk, Conn.), Nick Franciscus Wilhelmus Thissen (Eindhoven, Netherlands), Leendert Jan Karssemeijer ('s Hertogenbosch, Netherlands), Igor Matheus Petronella Aarts (Port Chester, N.Y.) and Zahrasadat Dastouri (Norwalk, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems, apparatuses, and methods are provided for correcting the detected positions of alignment marks disposed on a substrate and aligning the substrate using the correct...