US Patent Issued to ASML NETHERLANDS on Nov. 25 for "Interferometer system, positioning system, a lithographic apparatus, a jitter determination method, and a device manufacturing method" (Dutch Inventor)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,481,226, issued on Nov. 25, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Interferometer system, positioning system, a lithographic apparatus, a jitter determination method, and a device manufacturing method" was invented by Maarten Jozef Jansen (Hoogeloon, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "An interferometer system includes an optics system configured to allow a first light beam to travel along a measurement path including a target, and a second light beam to travel along a fixed reference path excluding the target; and a signal generator configured to introduce a power-modulated optical signal in the measurem...