US Patent Issued to ASML Netherlands on Nov. 18 for "Wavefront metrology sensor and mask therefor, method for optimizing a mask and associated apparatuses" (Dutch Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,267, issued on Nov. 18, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Wavefront metrology sensor and mask therefor, method for optimizing a mask and associated apparatuses" was invented by Lars Loetgering (Amsterdam), Stefan Michiel Witte (Hoofddorp, Netherlands), Christina Lynn Porter (Veldhoven, Netherlands) and Petrus Wilhelmus Smorenburg (Veldhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a wavefront sensor for measuring a wavefront of a radiation. The wavefront sensor comprises a mask comprising a pattern located in path of the radiation to interact with the radiation. The radiation impinging o...