ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,632, issued on Nov. 18, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Pellicle frame for EUV lithography" was invented by Kristof Custers (Hamont-Achel, Belgium), Ron Geeraard Catharina De Bruijn (Arendonk, Belgium), Matthias Kruizinga (Herten, Netherlands) and Lodewijk Alexander Schijvenaars (Oosterhout, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A pellicle frame includes: a first portion; and a plurality of second portions. The first portion is for connection to a border of a pellicle. The first portion includes a hollow and generally rectangular body. The plurality of second portions are for connection to a patt...