ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,629, issued on Nov. 18, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Membrane for EUV lithography" was invented by Maxim Aleksandrovich Nasalevich (Eindhoven, Netherlands), Erik Achilles Abegg (Eindhoven, Netherlands), Nirupam Banerjee (Eindhoven, Netherlands), Michiel Alexander Blauw (Breda, Netherlands), Derk Servatius Gertruda Brouns (Herentals, Belgium), Paul Janssen (Eindhoven, Netherlands), Matthias Kruizinga (Herten, Netherlands), Egbert Lenderink (Waalre, Netherlands), Nicolae Maxim (Eindhoven, Netherlands), Andrey Nikipelov (Eindhoven, Netherlands), Arnoud Willem Notenboom (Rosmalen, Netherlands), Claudia Piliego (Eindhoven, Netherlands), Maria Peter (...