ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,069, issued on Nov. 18, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Charged particle assessment tool, inspection method" was invented by Marco Jan-Jaco Wieland (Delft, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A charged-particle tool including: a condenser lens array configured to separate a beam of charged particles into a first plurality of sub-beams along a respective beam path and to focus each of the sub-beams to a respective intermediate focus; an array of objective lenses, each objective lens configured to project one of the plurality of sub-beams onto a sample; a corrector including an array of elongate ...