US Patent Issued to ASML Netherlands on Nov. 11 for "Systems and methods for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus" (California Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,668, issued on Nov. 11, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Systems and methods for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus" was invented by Weiming Ren (San Jose, Calif.), Xuedong Liu (San Jose, Calif.), Xuerang Hu (San Jose, Calif.), Xinan Luo (San Jose, Calif.) and Zhongwei Chen (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a ma...