US Patent Issued to ASML Netherlands on Nov. 11 for "Photo-electrical evolution defect inspection" (California Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,674, issued on Nov. 11, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Photo-electrical evolution defect inspection" was invented by Jun Jiang (San Jose, Calif.), Chih-Yu Jen (San Jose, Calif.), Ning Ye (San Jose, Calif.) and Jian Zhang (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A charged particle beam system may include a primary source, a secondary source, and a controller. The primary source may be configured to emit a charged particle beam along an optical axis onto a region of a sample. The secondary source may be configured to irradiate the region of the sample. The controller may be configured to contro...