US Patent Issued to ASML NETHERLANDS on Nov. 11 for "Method of controlling a patterning process, device manufacturing method" (Dutch Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,468,234, issued on Nov. 11, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method of controlling a patterning process, device manufacturing method" was invented by Jeroen Van Dongen (Houten, Netherlands), Elliott Gerard McNamara (Eindhoven, Netherlands), Paul Christiaan Hinnen (Veldhoven, Netherlands) and Marinus Jochemsen (Veldhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of controlling a patterning process are disclosed. In one arrangement, tilt data resulting from a measurement of tilt in an etching path through a target layer of a structure on a substrate is obtained. The tilt represents a deviation in a...