ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,468,235, issued on Nov. 11, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Method and apparatus to determine a patterning process parameter" was invented by Anagnostis Tsiatmas (Eindhoven, Netherlands), Paul Christiaan Hinnen (Veldhoven, Netherlands), Elliott Gerard Mc Namara (Eindhoven, Netherlands), Thomas Theeuwes (Veldhoven, Netherlands), Maria Isabel De La Fuente Valentin (Eindhoven, Netherlands), Mir Homayoun Shahrjerdy (Eindhoven, Netherlands), Arie Jeffrey Den Boef (Waalre, Netherlands) and Shu-Jin Wang (Veldhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method including: obtaining a detected representation...