US Patent Issued to ASML Netherlands on May 6 for "Hybrid droplet generator for extreme ultraviolet light sources in lithographic radiation systems" (Dutch, American Inventors)

ALEXANDRIA, Va., June 10 -- United States Patent no. 12,295,088, issued on May 6, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Hybrid droplet generator for extreme ultraviolet light sources in lithographic radiation systems" was invented by Benjamin Andrew Sams (San Diego), Dietmar Uwe Herbert Trees (San Diego), Theodorus Wilhelmus Driessen (San Diego), Herman Harry Borggreve (Waalre, Netherlands), Brandon Michael Johnson (Escondido, Calif.) and Vikas Giridhar Telkar (Escondido, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A droplet generator nozzle (800, 820/830) includes a metal body (802, 822), a metal fitting (812, 823/833) arranged adjacent to the metal body, and a capillary...