US Patent Issued to ASML NETHERLANDS on May 27 for "Method of manufacturing a substrate support for a lithographic apparatus, substrate table, lithographic apparatus, device manufacturing method, method of use" (Dutch Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,756, issued on May 27, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method of manufacturing a substrate support for a lithographic apparatus, substrate table, lithographic apparatus, device manufacturing method, method of use" was invented by Michael Marinus Anna Steur (Eindhoven, Netherlands), Nicolaas Ten Kate (Almkerk, Netherlands), Siegfried Alexander Tromp (Knegsel, Netherlands), Koen Gerhardus Winkels (Schijndel, Netherlands) and Antonius Franciscus Johannes De Groot (Lierop, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Substrate tables and methods of manufacturing substrate supports for substrate tables. In o...