US Patent Issued to ASML NETHERLANDS on May 27 for "Method in the manufacturing process of a device, a non-transitory computer-readable medium and a system configured to perform the method" (Dutch, American Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,175, issued on May 27, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method in the manufacturing process of a device, a non-transitory computer-readable medium and a system configured to perform the method" was invented by Wim Tjibbo Tel (Helmond, Netherlands), Antoine Gaston Marie Kiers (Veldhoven, Netherlands), Vadim Yourievich Timoshkov (Veldhoven, Netherlands), Hermanus Adrianus Dillen (Maarheeze, Netherlands), Yichen Zhang (Eindhoven, Netherlands), Te-Sheng Wang (San Jose, Calif.) and Tzu-Chao Chen (Dublin, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for determining an image-metric of features on a substrat...