ALEXANDRIA, Va., June 17 -- United States Patent no. 12,313,980, issued on May 27, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Inspection system, lithographic apparatus, and inspection method" was invented by Alexey Olegovich Polyakov (Veldhoven, Netherlands), Erwin Paul Smakman (Veldhoven, Netherlands), Andrey Nikipelov (Veldhoven, Netherlands) and Albertus Victor Gerardus Mangnus (Veldhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "An inspection system that include a selective deposition tool configured to receive a sample and selectively deposit a material onto the sample, an inspection tool configured to perform an inspection process on the sample provided with the ...