ALEXANDRIA, Va., June 16 -- United States Patent no. 12,305,979, issued on May 20, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Interferometer system and lithographic apparatus" was invented by Maarten Jozef Jansen (Hoogeloon, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "Interferometer system including a first detector for receiving a first measurement beam travelling to a reference surface; a second detector for receiving a second measurement beam travelling to the target surface; a reference variable delay path and/or measurement variable delay path and a delay path controller for adapting a delay length. A reference spectral coherence pulse occurs at the first detector, a...