ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,545, issued on May 20, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Determining lithographic matching performance" was invented by Yingchao Cui (Eindhoven, Netherlands), Hadi Yagubizade (Eindhoven, Netherlands), Xiuhong Wei (Eindhoven, Netherlands), Daan Maurits Slotboom (Wolphaartsdijk, Netherlands), Jeonghyun Park (Eindhoven, Netherlands), Sarathi Roy (Eindhoven, Netherlands), Yichen Zhang (Eindhoven, Netherlands), Mohammad Reza Kamali (Eindhoven, Netherlands) and Sang Uk Kim (Yong-In, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for determining lithographic matching performance includes obtaining first m...