US Patent Issued to ASML Netherlands on May 13 for "Objective lens system for fast scanning large FOV" (Chinese, American Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,458, issued on May 13, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Objective lens system for fast scanning large FOV" was invented by Shuai Li (Beijing) and Zhongwei Chen (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of th...